Improved Method to Measure the Thickness of Thin Films with a Photoelectric Ellipsometer
- 1 April 1957
- journal article
- research article
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 28 (4) , 283-285
- https://doi.org/10.1063/1.1715860
Abstract
This article describes the advantages of a photoelectric ellipsometer over a visual instrument for the measurement of the thickness of films from 1 A up to many thousand A. Experimental curves are given showing the unambiguous correlation between film thickness and position of two rotating elements, a λ/4 plate and an analyzing Nicol prism.Keywords
This publication has 4 references indexed in Scilit:
- OPTICAL PROPERTIES OF SURFACE FILMSAnnals of the New York Academy of Sciences, 1951
- Optical Properties of Surface Films. IIReview of Scientific Instruments, 1949
- Optical Measurements of Surface Films. IReview of Scientific Instruments, 1948
- The Ellipsometer, an Apparatus to Measure Thicknesses of Thin Surface FilmsReview of Scientific Instruments, 1945