Atomic structure of the metastablec(4×4) reconstruction of Si(100)
- 15 October 1992
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 46 (16) , 10251-10256
- https://doi.org/10.1103/physrevb.46.10251
Abstract
A c(4×4) reconstruction can be formed on the clean Si(100) surface by special surface treatment techniques. We have studied the atomic structure of this metastable phase, which is prepared by hydrogen exposure and annealing, using scanning tunneling microscopy and first-principles total-energy calculations. A new model is derived which has two types of surface dimers oriented parallel and perpendicular to the underlying 2×1 dimer rows. Our results are thus in disagreement with the missing dimer model which has earlier been proposed in the literature.Keywords
This publication has 15 references indexed in Scilit:
- A RHEED study of the surface reconstructions of Si(001) during gas source MBE using disilaneSurface Science, 1992
- Si(100)-c(4×4) metastable surface observed by scanning tunneling microscopyPhysical Review B, 1992
- Surface reconstructions of Si(001) observed using reflection-high- energy-electron diffraction during molecular-beam epitaxial growth from disilaneApplied Physics Letters, 1991
- Orientational ordering in mixed cyanide crystals: (NaCN(KCNPhysical Review B, 1991
- Surface reconstructions of GaAs(100) observed by scanning tunneling microscopyPhysical Review B, 1990
- Formation and atomic configuration of Si(100)c(4 × 4) structureSurface Science, 1988
- Structural model of Si(100)-Physical Review B, 1987
- Low Temperature Surface Cleaning of Silicon and Its Application to Silicon MBEJournal of the Electrochemical Society, 1986
- Si epitaxy by molecular beam methodSurface Science, 1979
- A LEED STUDY OF THE HOMOEPITAXIAL GROWTH OF THICK SILICON FILMSApplied Physics Letters, 1967