Recent improvements in double charged ion beam energy purity for serial process ion implanters
- 1 January 1987
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 21 (1-4) , 400-404
- https://doi.org/10.1016/0168-583x(87)90865-2
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- A twin-well CMOS process employing high-energy ion implantationIEEE Transactions on Electron Devices, 1986