CO2 laser-assisted removal of submicron particles from solid surfaces

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Abstract
A CO2 laser‐based system was used to provoke the vapor‐assisted removal of contaminating particles from different kinds of surfaces. Particles of alumina, silicon carbide, boron carbide, and cerium dioxide, with a size as small as 0.1 μm, have been efficiently removed from silicon, gold, and silicon dioxide surfaces. The dependence of the cleaning efficiency on the laser fluence was investigated; a threshold was found at 0.65 J/cm2 and the efficiency was highest for a fluence ranging from 2.9 to 3.2 J/cm2 for silicon, and 3.2 J/cm2 for gold and silicon dioxide surfaces. The amount of the water vapor which condenses at the surface was also found to play a major role, the best results being obtained with a condensed thickness calculated to be 6 μm. The zeta potential value of the contaminant particles with respect to that of the surface greatly influences the cleaning process.