Modeling of plasma-etch processes using well stirred reactor approximations and including complex gas-phase and surface reactions
- 1 January 1995
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Plasma Science
- Vol. 23 (4) , 539-549
- https://doi.org/10.1109/27.467973
Abstract
No abstract availableThis publication has 26 references indexed in Scilit:
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