The Microstructure and Properties of Layered Oxide Thin Films Fabricated by MOCVD
- 1 January 1995
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Fatigue-free SrBi2(TaxNb1−x)2O9 ferroelectric thin filmsMaterials Science and Engineering: B, 1995
- Novel fatigue-free layered structure ferroelectric thin filmsMaterials Science and Engineering: B, 1995
- Fatigue-free ferroelectric capacitors with platinum electrodesNature, 1995
- Trends in the development of ULSI DRAM capacitorsIntegrated Ferroelectrics, 1994
- Effects of dopants in PZT filmsJournal of Materials Research, 1994
- Signal magnitudes in high density ferroelectric memoriesIntegrated Ferroelectrics, 1994
- Comparison of lead zirconate titanate thin films on ruthenium oxide and platinum electrodesJournal of Applied Physics, 1994
- RuO2 films by metal-organic chemical vapor depositionJournal of Materials Research, 1993
- Correlations Among Degradations in Lead Zirconate Titanate thin Film CapacitorsMRS Proceedings, 1993
- Preparation and ferroelectric properties of PbZr0.53Ti0.47O3 thin films by spin coating and metalorganic decompositionJournal of Applied Physics, 1991