Enhanced reliability in Si MOSFETs with channel lengths under 0.2 micron
- 31 October 1990
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 33 (10) , 1275-1278
- https://doi.org/10.1016/0038-1101(90)90030-i
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Reduction of channel hot-electron-generated substrate current in sub-150-nm channel length Si MOSFET'sIEEE Electron Device Letters, 1988
- High transconductance and velocity overshoot in NMOS devices at the 0.1- mu m gate-length levelIEEE Electron Device Letters, 1988
- Nanostructure technologyIBM Journal of Research and Development, 1988
- Efficient and accurate use of the energy transport method in device simulationIEEE Transactions on Electron Devices, 1988
- The Monte Carlo method for the solution of charge transport in semiconductors with applications to covalent materialsReviews of Modern Physics, 1983
- Submicrometer MOSFET structure for minimizing hot-carrier generationIEEE Transactions on Electron Devices, 1982
- AN EFFICIENT TECHNIQUE FOR TWO‐DIMENSIONAL SIMULATION OF VELOCITY OVERSHOOT EFFECTS IN Si AND GaAs DEVICESCOMPEL: The International Journal for Computation and Mathematics in Electrical and Electronic Engineering, 1982