Stability of amorphous Fe-W alloys in multilayer metallizations on silicon
- 1 September 1983
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 107 (1) , 73-80
- https://doi.org/10.1016/0040-6090(83)90009-3
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Amorphous Metallizations for High-Temperature Semiconductor Device ApplicationsIEEE Transactions on Industrial Electronics, 1982
- Diffusion barriers in layered contact structuresJournal of Vacuum Science and Technology, 1981
- Phase separation in alloy-Si interactionApplied Physics Letters, 1980