Phase composition of SnOx thin films obtained by reactive d.c. sputtering
- 1 May 1979
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 59 (2) , 147-155
- https://doi.org/10.1016/0040-6090(79)90288-8
Abstract
No abstract availableKeywords
This publication has 16 references indexed in Scilit:
- Optical and electrical properties of SnO2 thin films in relation to their stoichiometric deviation and their crystalline structureThin Solid Films, 1977
- Electrical and Optical Properties of GaSe-SnO2HeterojunctionsJapanese Journal of Applied Physics, 1976
- Transparent heat mirrors for solar-energy applicationsApplied Optics, 1976
- Deposition of In2O3 : Sn Film on Large SubstrateSHINKU, 1976
- Electrical and Optical Properties of Tin Oxide FilmsJournal of the American Ceramic Society, 1974
- Electronic energy band calculations in SnO2Solid State Communications, 1972
- Electrical and Optical Properties of Reduced Stannic Oxide CrystalsJapanese Journal of Applied Physics, 1971
- SnO2-Semi-Conductor Heterojunction. Electrical Properties of a Particular MOS StructureJapanese Journal of Applied Physics, 1970
- The Effect of Crystallographic Orientation on the Oxidation of TinJournal of the Electrochemical Society, 1964
- The system tin + oxygenTransactions of the Faraday Society, 1956