Reactive magnetron sputtering of CNx films: Ion bombardment effects and process characterization using optical emission spectroscopy
- 1 October 1999
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 86 (7) , 3646-3654
- https://doi.org/10.1063/1.371273
Abstract
No abstract availableThis publication has 37 references indexed in Scilit:
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