Electron diffraction from polycrystalline materials showing stress induced preferred orientation
- 1 July 1999
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 86 (1) , 230-236
- https://doi.org/10.1063/1.370721
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
- The orientation dependence of elastic strain energy in cubic crystals and its application to the preferred orientation in titanium nitride thin filmsJournal of Physics: Condensed Matter, 1996
- Molecular-dynamics study of compressive stress generationPhysical Review B, 1996
- Development of preferred orientation in polycrystalline TiN layers grown by ultrahigh vacuum reactive magnetron sputteringApplied Physics Letters, 1995
- High-flux low-energy (≂20 eV) N+2 ion irradiation during TiN deposition by reactive magnetron sputtering: Effects on microstructure and preferred orientationJournal of Applied Physics, 1995
- Diamond-like carbonPure and Applied Chemistry, 1994
- Generation and applications of compressive stress induced by low energy ion beam bombardmentJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1993
- Effects of strain energy on the preferred orientation of TiN thin filmsJournal of Applied Physics, 1993
- A simple model for the formation of compressive stress in thin films by ion bombardmentThin Solid Films, 1993
- Intrinsic stress in sputtered thin filmsJournal of Vacuum Science & Technology A, 1991
- Reactive-sputter-deposited TiN films on glass substratesThin Solid Films, 1991