Reactive-sputter-deposited TiN films on glass substrates
- 1 March 1991
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 197 (1-2) , 117-128
- https://doi.org/10.1016/0040-6090(91)90225-m
Abstract
No abstract availableKeywords
This publication has 32 references indexed in Scilit:
- Correlation of process and system parameters with structure and properties of physically vapour- deposited hard coatingsThin Solid Films, 1988
- The Ti-N system: Equilibrium between the δ, ϵ and α phases and the conditions of formation of the lobier and marcon metastable phaseJournal of the Less Common Metals, 1987
- Adhesion of titanium nitride coatings on high-speed steelsJournal of Vacuum Science & Technology A, 1985
- The stress in ion-plated HfN and TiN coatingsThin Solid Films, 1985
- Microhardness of TiNx coatings obtained by reactive cathodic sputteringThin Solid Films, 1981
- Evaluation of coating wear resistance for bulk metal formingThin Solid Films, 1980
- Properties of TiNxfilms reactively sputtered in an argon-nitrogen atmosphereThin Solid Films, 1979
- High Rate Thick Film GrowthAnnual Review of Materials Science, 1977
- Lattice parameter of the non-stoichiometric compound TiNxJournal of Applied Crystallography, 1975
- Structural Studies on the Titanium-Nitrogen System.Acta Chemica Scandinavica, 1962