The Early Stages of Microwave-Assisted Chemical Vapor Deposition of Diamond on Fused Silica Substrates
- 1 January 1992
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- The interfacial structure and composition of diamond films grown on various substratesJournal of Materials Research, 1992
- Near-interface characterization of diamond films on silica and siliconJournal of Materials Research, 1991
- Current Issues and Problems in the Chemical Vapor Deposition of DiamondScience, 1990
- On the role of oxygen and hydrogen in diamond-forming dischargesJournal of Applied Physics, 1989
- Low-Pressure, Metastable Growth of Diamond and "Diamondlike" PhasesScience, 1988
- Synthesis of diamonds by use of microwave plasma chemical-vapor deposition: Morphology and growth of diamond filmsPhysical Review B, 1988
- Growth of diamond particles from methane-hydrogen gasJournal of Materials Science, 1982