Alumina-Ti Interface Reactions Studied By AES And UPS
- 1 January 1985
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 14 references indexed in Scilit:
- Chemical reactions at Pt/oxide/Si and Ti/oxide/Si interfacesJournal of Vacuum Science & Technology A, 1985
- Chemical bonding and reactions at Ti/Si and Ti/oxygen/Si interfacesJournal of Vacuum Science & Technology A, 1983
- Silicide and Schottky barrier formation in the Ti-Si and the Ti-SiOx -Si systemsJournal of Applied Physics, 1982
- Al-interface study using surface soft-x-ray absorption and photoemission spectroscopyPhysical Review B, 1979
- Auger and X-ray photoelectron spectroscopic depth profiling techniques applied to ultra-thin titanium filmsThin Solid Films, 1978
- Electron spectroscopy studies of the chemisorption of O2, H2 and H2O on the TiO2(100) surfaces with varied stoichiometry: Evidence for the photogeneration of Ti+3 and for its importance in chemisorptionSurface Science, 1978
- Oxidation of Aluminum Surfaces Studied by Synchrotron Radiation Photoelectron SpectroscopyPhysica Scripta, 1977
- Deconvolution method for composition profiling by Auger sputtering techniqueSurface Science, 1976
- Techniques for elemental composition profiling in thin filmsC R C Critical Reviews in Solid State Sciences, 1973
- Photoemission energy level measurements of sorbed gases on titaniumSolid State Communications, 1972