Titanium monophosphide (TiP) layers as potential diffusion barriers
- 30 November 1997
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 37-38, 397-402
- https://doi.org/10.1016/s0167-9317(97)00138-x
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- Manufacturing aspects of low pressure chemical-vapor-deposited TiN barrier layersThin Solid Films, 1993
- Crystal Growth and Some Properties of Titanium MonophosphideJournal of the Electrochemical Society, 1976
- An X-Ray Investigation of Transition Metal Phosphides.Acta Chemica Scandinavica, 1954
- Beiträge zur systematischen Verwandtschaftslehre. 83. Über die Verbindungsfähigkeit von Titan mit PhosphorZeitschrift für anorganische und allgemeine Chemie, 1938