Reaction of thin metal films with SiO2 substrates
- 1 April 1978
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 21 (4) , 667-675
- https://doi.org/10.1016/0038-1101(78)90335-0
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Thin film metallization of oxides in microelectronicsThin Solid Films, 1973
- Silicide formation at low temperatures by metal-SiO2 interactionPhysica Status Solidi (a), 1973
- Principles and applications of ion beam techniques for the analysis of solids and thin filmsThin Solid Films, 1973
- Some elastic constant data on minerals relevant to geophysicsReviews of Geophysics, 1968