Improved fabrication of 4 × 4 polarisation insensitive switch matrices on InP by introduction of an etch stop layer
- 30 December 2002
- conference paper
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Low driving voltage or current digital optical switch on InP for multiwavelength system applicationsElectronics Letters, 1992
- Reactive ion etching of InP using CH4/H2 mixtures: Mechanisms of etching and anisotropyJournal of Vacuum Science & Technology B, 1989
- Reactive ion etching of polyimide for multi-level resist and contact hole applicationsMicroelectronic Engineering, 1985