CVI. The sensitivity of electron diffraction as a means of detecting thin surface films: I
- 1 September 1955
- journal article
- research article
- Published by Taylor & Francis in Journal of Computers in Education
- Vol. 46 (380) , 927-940
- https://doi.org/10.1080/14786440908520612
Abstract
Very thin layers (0–20 Å) of silver bromide and of copper have been deposited on to smooth (111) surfaces of silver single crystals. The thickness of these layers has been determined by means of a radioactive technique. The electron diffraction patterns from the layers have been studied as a function of their thickness. The layers do not grow as uniform films but as nucleated deposits. It is found that the thinnest detectable layer is 0·4 Å in mean thickness for the silver bromide and 0·8 Å for the copper.Keywords
This publication has 8 references indexed in Scilit:
- An electron diffraction specimen chamber with a specimen vacuum lockJournal of Scientific Instruments, 1954
- An electron-diffraction examination of thin films of lithium fluoride and copper prepared by vacuum evaporationProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1954
- A Tracer Method for the Thickness Measurement of Thin Bi FilmsReview of Scientific Instruments, 1952
- The Structure of Thin Layers of Zinc Oxide Grown on a Zinc Single CrystalProceedings of the Physical Society. Section A, 1951
- The calculation of the inner potential of a crystalProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1951
- Examination of Thin Overgrowths by Multiple Scattering of ElectronsJournal of Applied Physics, 1950
- One-dimensional dislocations. I. Static theoryProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1949
- Die äußere Form der Kristalle in ihrem Einfluß auf die Interferenzerscheinungen an RaumgitternAnnalen der Physik, 1936