Interpretation of destructive breakdown in Langmuir molecular films
- 31 August 1974
- journal article
- research article
- Published by Elsevier in Thin Solid Films
- Vol. 23 (1) , S9-S12
- https://doi.org/10.1016/0040-6090(74)90225-9
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
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- Thickness dependent studies of dielectric breakdown in Langmuir thin molecular filmsSolid State Communications, 1973
- Thickness dependence of breakdown fieldThin Solid Films, 1972
- A theory of localized electronic breakdown in insulating filmsAdvances in Physics, 1972
- Thickness dependence of breakdown field in thin filmsThin Solid Films, 1971
- Switching and breakdown in filmsThin Solid Films, 1971
- The maximum dielectric strength of thin silicon oxide filmsIEEE Transactions on Electron Devices, 1966