RHEED investigation of limiting thickness epitaxy during low-temperature Si-MBE on (100) surface
- 1 December 1998
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 336 (1-2) , 179-182
- https://doi.org/10.1016/s0040-6090(98)01234-6
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- Sb Delta-Type Doping in Si-MBE SuperlatticesMaterials Science Forum, 1991
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- Low temperature kinetics of Si(100) MBE growthThin Solid Films, 1989