Chemical influence of inert gas on the thin film stress in plasma-enhanced chemical vapor deposited a-SiN: H films
- 1 February 1996
- journal article
- Published by Springer Nature in Journal of Materials Research
- Vol. 11 (2) , 391-398
- https://doi.org/10.1557/jmr.1996.0048
Abstract
No abstract availableKeywords
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