The effect of diluent gas and rapid thermal annealing on the properties of plasma-deposited silicon nitride films
- 1 March 1992
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 209 (2) , 215-222
- https://doi.org/10.1016/0040-6090(92)90678-5
Abstract
No abstract availableKeywords
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