Each dopant can absorb more than ten photons: Transient absorbance measurement at excitation laser wavelength in polymer ablation
- 2 May 1994
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 64 (18) , 2451-2453
- https://doi.org/10.1063/1.111596
Abstract
Transient absorbance of two doped polymers, poly(methyl methacrylate) with pyrene or biphenyl, at the excitation wavelength was measured under laser ablation conditions. The fluence dependence of the etch depth was explained in terms of absorbance changes due to transient species and scattering by ablated fragments. The total energy absorbed at the threshold was confirmed to be almost identical, independent of the dopant. The number of photons absorbed per dopant was about 12 at the threshold, which will be discussed on the proposed model.Keywords
This publication has 10 references indexed in Scilit:
- Mass spectrometric studies on laser ablation of polystyrene sensitized with anthraceneThe Journal of Physical Chemistry, 1993
- KrF-laser ablation of polyurethaneApplied Physics A, 1993
- Time-resolved Absorption Spectral Measurement of Polymer Films during Laser AblationChemistry Letters, 1993
- Direct measurement of polymer temperature during laser ablation using a molecular thermometerJournal of Applied Physics, 1992
- Fluence-dependent transmission of polyimide at 248 nm under laser ablation conditionsApplied Physics Letters, 1991
- Femtosecond uv excimer laser ablationApplied Physics B Laser and Optics, 1987
- Temporal measurements of photofragment attenuation at 248 nm in the laser ablation of polyimide in airApplied Physics Letters, 1987
- Ultraviolet laser ablation of polyimide filmsJournal of Applied Physics, 1987
- Self-developing UV photoresist using excimer laser exposureJournal of Applied Physics, 1983
- Direct etching of polymeric materials using a XeCl laserApplied Physics Letters, 1983