Nickel silicide thermal stability on polycrystalline and single crystalline silicon
- 1 November 1996
- journal article
- Published by Elsevier in Materials Chemistry and Physics
- Vol. 46 (2-3) , 209-214
- https://doi.org/10.1016/s0254-0584(97)80015-6
Abstract
No abstract availableThis publication has 15 references indexed in Scilit:
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