Structural studies of amorphous Si:Ni:H
- 1 November 1989
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 113 (1) , 41-50
- https://doi.org/10.1016/0022-3093(89)90316-5
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Depth dependence for extended x-ray-absorption fine-structure spectroscopy detected via electron yield in He and in vacuumPhysical Review B, 1988
- X-ray structural study of amorphous Mo-Ge filmsPhysical Review B, 1988
- Amorphous nickel silicides prepared by magnetron co-sputteringJournal of Non-Crystalline Solids, 1987
- LEED investigations on the interaction of Pd and Ni with different Si(111) surfacesSurface Science, 1984
- Formation of Ultrathin Single-Crystal Silicide Films on Si: Surface and Interfacial Stabilization of Si-NiEpitaxial StructuresPhysical Review Letters, 1983
- Metal-insulator transitions in amorphous semiconductorsPhilosophical Magazine Part B, 1980
- Ab initio calculations of amplitude and phase functions for extended x-ray absorption fine structure spectroscopyJournal of the American Chemical Society, 1979
- Metastable impurity bands: Conduction in Si1−xCox and Si1−xNix alloy filmsSolid State Communications, 1977
- Theory of the extended x-ray absorption fine structurePhysical Review B, 1975