Comparison of focused ion beam and laser techniques for optical mask repair
- 1 December 1987
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 6 (1-4) , 597-603
- https://doi.org/10.1016/0167-9317(87)90093-1
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Repair of opaque defects in photomasks using focused ion beamsJournal of Physics D: Applied Physics, 1987
- Focused ion beam repair techniques for clear and opaque defects in masksMicroelectronic Engineering, 1985
- Projected range distributions of implanted ions in multilayer targetsJournal of Physics C: Solid State Physics, 1984
- Liquid metal source of gold ionsReview of Scientific Instruments, 1981