Nanoimprint lithography: challenges and prospects
- 25 May 2001
- journal article
- Published by IOP Publishing in Nanotechnology
- Vol. 12 (2) , 91-95
- https://doi.org/10.1088/0957-4484/12/2/303
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
- Quantitative analysis of the molding of nanostructuresJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2000
- Master replication into thermosetting polymers for nanoimprintingJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2000
- Nanoimprint lithography at the 6 in. wafer scaleJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2000
- Novel alignment system for imprint lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2000
- Step and stamp imprint lithography using a commercial flip chip bonderPublished by SPIE-Intl Soc Optical Eng ,2000
- Fabrication of nanostructures using a UV-based imprint techniqueMicroelectronic Engineering, 2000
- Step and flash imprint lithography: a new approach to high-resolution patterningPublished by SPIE-Intl Soc Optical Eng ,1999
- Multilayer resist methods for nanoimprint lithography on nonflat surfacesJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1998
- Imprint of sub-25 nm vias and trenches in polymersApplied Physics Letters, 1995