The effect of stoichiometry on sputtering, deuterium retention and surface damage in titanium carbide films
- 1 January 1988
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 156 (2) , 231-238
- https://doi.org/10.1016/0040-6090(88)90316-1
Abstract
No abstract availableKeywords
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