Constant Final-State Photoemission Study of Silicon Fluoride Reaction Layer Created During Etching: Morphology of the Reaction Layer
- 1 January 1986
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- An ellipsoidal mirror display analyzer system for electron energy and angular measurementsNuclear Instruments and Methods, 1980