Soft X-ray photoemission study of the silicon-fluorine etching reaction
- 1 January 1986
- journal article
- Published by Elsevier in Surface Science
- Vol. 165 (1) , 277-287
- https://doi.org/10.1016/0039-6028(86)90675-8
Abstract
No abstract availableThis publication has 12 references indexed in Scilit:
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