Reaction of atomic fluorine with silicon: The gas phase products
- 1 May 1982
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 53 (5) , 3799-3805
- https://doi.org/10.1063/1.331122
Abstract
SiF2 and SiF4 have been identified as gas phase products of the reaction between atomic fluorine and silicon. Atomic fluorine is supplied by a low density molecular beam hitting a silicon target in a high vacuum. Reaction products were detected by mass spectrometric measurements. Activation energies for the production of SiF2 and SiF4 were found to be 0.09±0.02 and 0.15±0.02 eV/°K, respectively, in good agreement with the values measured by flowing afterglow techniques. The reaction probability for the reaction 4F+Si→SiF4 was found to be 0.016 at 100 °C.This publication has 15 references indexed in Scilit:
- The reaction of fluorine atoms with siliconJournal of Applied Physics, 1981
- Electron impact ionization cross sections of F2 and Cl2The Journal of Chemical Physics, 1981
- Studies of chemiluminescence accompanying fluorine atom etching of siliconJournal of Applied Physics, 1980
- Transverse ionization of a seeded molecular beam: Effects of space-charge on mass spectra and velocity measurementsInternational Journal of Mass Spectrometry and Ion Physics, 1980
- The etching of silicon with XeF2 vaporApplied Physics Letters, 1979
- The chemistry of silicon difluoride: A reactive carbene analogJournal of Chemical Education, 1976
- Positive- and negative-ion formation due to the electron bombardment of germanium tetrafluorideInternational Journal of Mass Spectrometry and Ion Physics, 1972
- Ionization Cross Sections of the Elements Calculated from Mean-Square Radii of Atomic OrbitalsThe Journal of Chemical Physics, 1967
- Chemistry of Silicon DifluorideScience, 1967
- Mass-Spectrometric Studies at High Temperatures. II. The Dissociation Energies of the Monofluorides and Difluorides of Silicon and GermaniumThe Journal of Chemical Physics, 1964