Energetics of surface and subsurface carbon incorporation in Si(100)
- 15 September 2000
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 62 (11) , 6881-6884
- https://doi.org/10.1103/physrevb.62.6881
Abstract
We have studied the initial stages of carbon incorporation in Si(100) by means of first principles calculations for a large variety of atomic configurations involving substitutional C impurities in surface and subsurface sites of a surface cell. For and mixed configurations, with half of the C atoms at the surface and the others in sites of the fourth layer, are found to be energetically favored, suggesting that carbon penetration in the subsurface region already takes place at low coverages. Calculated C core binding energies for these mixed configurations agree well with x-ray photoelectron spectroscopy results for the reconstructed surface.
Keywords
This publication has 21 references indexed in Scilit:
- The surface morphology of Si (100) after carbon depositionSurface Science, 1998
- Substitutional carbon impurities in thin silicon films: Equilibrium structure and propertiesJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1998
- Energetics and Equilibrium Properties of Thin Pseudomorphic Si1-xCx(100) Layers in SiPhysical Review Letters, 1997
- Enhanced Solubility of Impurities and Enhanced Diffusion near Crystal SurfacesPhysical Review Letters, 1995
- Strain compensated heterostructures in the Si1−x−yGexCy ternary systemJournal of Vacuum Science & Technology A, 1994
- Strain-stabilized highly concentrated pseudomorphiclayers in SiPhysical Review Letters, 1994
- Metastable SiGeC formation by solid phase epitaxyApplied Physics Letters, 1993
- 75-GHz f/sub T/ SiGe-base heterojunction bipolar transistorsIEEE Electron Device Letters, 1990
- Heterojunction bipolar transistors using Si-Ge alloysIEEE Transactions on Electron Devices, 1989
- Equilibrium alloy properties by direct simulation: Oscillatory segregation at the Si-Ge(100) 2×1 surfacePhysical Review Letters, 1989