Integrated conventional and laser re-crystallised amorphous silicon thin film transistors for large area imaging and display applications
- 1 December 1993
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 164-166, 727-730
- https://doi.org/10.1016/0022-3093(93)91100-h
Abstract
No abstract availableKeywords
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- On-Chip Bottom-Gate Polysilicon and Amorphous Silicon Thin-Film Transistors Using Excimer Laser AnnealingJapanese Journal of Applied Physics, 1990
- High-performance TFTs fabricated by XeCl excimer laser annealing of hydrogenated amorphous-silicon filmIEEE Transactions on Electron Devices, 1989