Growth behavior of boron-doped diamond in microwave plasma-assisted chemical vapor deposition using trimethylboron as the dopant source
- 31 January 1998
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 7 (1) , 88-95
- https://doi.org/10.1016/s0925-9635(98)80001-0
Abstract
No abstract availableKeywords
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