Comparative study of trimethylboron doping of hot filament chemically vapour deposited and microwave plasma chemically vapour deposited diamond films
- 1 December 1994
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 253 (1-2) , 136-140
- https://doi.org/10.1016/0040-6090(94)90308-5
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Electrical Properties of Boron-Implanted Homoepitaxial Diamond FilmsJapanese Journal of Applied Physics, 1993
- Analysis of contamination in diamond films by secondary ion mass spectroscopyDiamond and Related Materials, 1992
- Boron doping of diamond thin filmsApplied Physics Letters, 1989
- Characterization of Boron-Doped Diamond FilmJapanese Journal of Applied Physics, 1989
- Raman efficiency measurements of graphitePhysica B+C, 1981