On the residual stress and picostructure of titanium nitride films I: Implantation with argon or krypton
- 16 November 1992
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 54-55, 180-185
- https://doi.org/10.1016/s0257-8972(09)90047-0
Abstract
No abstract availableKeywords
This publication has 36 references indexed in Scilit:
- Microstructure modification of TiN by ion bombardment during reactive sputter depositionPublished by Elsevier ,2002
- Residual stress and the effect of implanted argon in films of zirconium nitride made by physical vapor depositionJournal of Vacuum Science & Technology A, 1992
- Structural analysis of tin films by Seemann-Bohlin X-ray diffractionThin Solid Films, 1990
- A further study of the state of residual stress in TiN films made by physical vapor deposition methodsJournal of Vacuum Science & Technology A, 1990
- A transmission electron microscopy study of xenon bubbles in ion-implanted tinPhilosophical Magazine A, 1990
- A contribution to the study of poisson's ratios and elasticconstants of TiN, ZrN and HfNThin Solid Films, 1990
- Mechanical properties, structure and performance of chemically vapor-deposited and physically vapor-deposited coated carbide toolsMaterials Science and Engineering: A, 1988
- Surface mechanical properties - effects of ion implantationNuclear Instruments and Methods, 1981
- Thermal-Expansion Measurements and Thermodynamics of Solid KryptonPhysical Review B, 1968
- Measurements of X-Ray Lattice Constant, Thermal Expansivity, and Isothermal Compressibility of Argon CrystalsPhysical Review B, 1966