Si 2pcore-level shifts at the Si(100)-SiO2interface: An experimental study

Si 2p core-level shifts are measured for a model system generated from HSi(${\mathrm{OCH}}_2$ ${\mathrm{CH}}_2$ ${)}_3$N and Si(100)-2×1 and compared to the result obtained from a species containing similar coordination about silicon, HSi(${\mathrm{OCH}}_3$ ${)}_3$. The dramatic difference in the products obtained is explained in terms of the chelate effect. The results are compared to previous results obtained using spherosiloxane clusters and an empirical, model-compound-based core-level shift assignment scheme is compared and contrasted with the conventional formal oxidation state assignment scheme. © 1996 The American Physical Society.