Uniaxial stress dependence of ultrasonic attenuation in p-type silicon
- 15 June 1972
- journal article
- Published by Elsevier in Solid State Communications
- Vol. 10 (12) , 1309-1312
- https://doi.org/10.1016/0038-1098(72)90966-0
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Low-Temperature Thermal Conductivity of-Type Ge and SiPhysical Review B, 1971
- Interaction of Microwave Phonons with Donor Electrons in Ge and SiPhysical Review B, 1970
- Effective-Mass Theoretical Approach to Optical and Microwave Phenomena in Semiconductors I. Zeeman Effect of Acceptors in Si and GeJournal of the Physics Society Japan, 1964
- Ultrasonic Wave Propagation in Doped-Germanium and-SiliconPhysical Review B, 1964
- Effect of Doping on the Elastic Constants of SiliconPhysical Review B, 1963
- Spin-Lattice Relaxation of Shallow Donor States in Ge and Si through a Direct Phonon ProcessPhysical Review B, 1960