The precision implant 9500 plasma flood system — the advanced solution to wafer charging
- 1 March 1995
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 96 (1-2) , 30-33
- https://doi.org/10.1016/0168-583x(94)00448-x
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Computer modelling for ion-beam system designNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1991
- Ion beam system design for ULSI device requirementsNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1991
- New approaches to charging controlNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1991