Very high frequency hydrogen plasma treatment of growing surfaces: a study of the p-type amorphous to microcrystalline silicon transition
- 1 May 2000
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 266-269, 624-629
- https://doi.org/10.1016/s0022-3093(99)00755-3
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- Plasma-enhanced chemical vapour deposition of microcrystalline silicon: On the dynamics of the amorphous-microcrystalline interface by optical methodsPhilosophical Magazine Part B, 2000
- Growth mechanism of microcrystalline silicon obtained from reactive plasmasThin Solid Films, 1999
- Hydrogen-mediated structural changes of amorphous and microcrystalline siliconPhysical Review B, 1998
- Effect of Hydrogen Plasma Treatments at very High Frequency on p-Type Amorphous and Microcrystalline Silicon FilmsMRS Proceedings, 1998
- Role of the hydrogen plasma treatment in layer-by-layer deposition of microcrystalline siliconApplied Physics Letters, 1997
- In situ correlation between the optical and electrical properties of thin intrinsic and n-type microcrystalline silicon filmsJournal of Applied Physics, 1997
- Hydrogen elimination and phase transitions in pulsed-gas plasma deposition of amorphous and microcrystalline siliconJournal of Applied Physics, 1997
- Microscopic characterization of microcrystalline silicon thin filmsThin Solid Films, 1996
- Reactor Design for a-SiPublished by Elsevier ,1995
- Highlights of preparative solid state chemistry in low pressure plasmasPublished by Walter de Gruyter GmbH ,1982