Effect of Hydrogen Plasma Treatments at very High Frequency on p-Type Amorphous and Microcrystalline Silicon Films
- 1 January 1998
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Hydrogen-mediated structural changes of amorphous and microcrystalline siliconPhysical Review B, 1998
- Nanoparticle formation in low-pressure silane plasmas: bridging the gap between a-Si:H and μc-Si filmsJournal of Non-Crystalline Solids, 1998
- Role of the hydrogen plasma treatment in layer-by-layer deposition of microcrystalline siliconApplied Physics Letters, 1997
- Real-time spectroscopic ellipsometry study of the growth of amorphous and microcrystalline silicon thin films prepared by alternating silicon deposition and hydrogen plasma treatmentPhysical Review B, 1995
- Reactor Design for a-SiPublished by Elsevier ,1995
- Preparation of ultrathin microcrystalline silicon layers by atomic hydrogen etching of amorphous silicon and end-point detection by real time spectroellipsometryApplied Physics Letters, 1994
- Mechanisms of Plasma Induced Silicon Deposition and the Control of the Properties of the DepositMRS Proceedings, 1988
- Effect of grain boundaries on the Raman spectra, optical absorption, and elastic light scattering in nanometer-sized crystalline siliconPhysical Review B, 1987
- Dominant reaction channels and the mechanism of silane decomposition in a H2-Si(s)-SiH4 glow dischargePlasma Chemistry and Plasma Processing, 1987