Study of plasmon—LO-phonon coupling in Te-dopedGa1xAlxAs

Abstract
Plasmon-LO-phonon coupling in n-type Ga1xAlxAs has been investigated by measuring the infrared reflectivity spectra of differently doped n-type samples having x0.14, x0.30, and x0.46. Two expressions for the dielectric function, one an additive form and the other a factorized form, have given satisfactory fits to the reflectivity data. The mode frequencies and damping rates in the plasmon-LO-phonon coupled mode systems are calculated and compared with the observed ones for the samples having x0.14 and x0.46. The Γ-point conduction-band effective mass for x0.14 is found to be mΓ*=(0.13±0.01)me and the resistivity obtained from the infrared spectra is approximately 30% higher than the value from dc measurements. The reflectivity minima are broadened by the large plasma damping in the samples having x0.46.