Low temperature plasma enhanced CVD of highly conductive single crystalline and polycrystalline silicon materials
- 1 January 1989
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 36 (1-4) , 23-38
- https://doi.org/10.1016/0169-4332(89)90896-9
Abstract
No abstract availableThis publication has 32 references indexed in Scilit:
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