Cubic Boron Nitride Prepared by an ECR Plasma
- 1 January 1991
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
A number of deposition techniques for cubic BN films from the vapor phase at low pressures have been proposed. We show that the essential factor for creating cubic BN films is a negative self-bias applied to the substrate. The optical and mechanical properties of the deposited films are characterized by reflectance and stress measurements, respectively.Keywords
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