Raman analysis of the configurational disorder in AlxGa1−xN films
- 13 October 1997
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 71 (15) , 2157-2159
- https://doi.org/10.1063/1.119367
Abstract
Raman analysis of the mode of in the composition range is presented. The line shape was observed to exhibit a significant asymmetry and broadening toward the high energy range. The spatial correlation model is discussed, and is shown to account for the line shape. The model calculations also indicate the lack of a long-range order in the chemical vapor deposition alloys. These results were confirmed by x-ray scattering: the relative intensity of the superlattice line was found to be negligible. The line broadening of the mode was found to exhibit a maximum at a composition indicative of a random disordered alloy system.
Keywords
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