Electromigration in two-level interconnect structures with Al alloy lines and W studs
- 1 July 1992
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 72 (1) , 291-293
- https://doi.org/10.1063/1.352335
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
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