Stress modification and characterization of thin SiC films grown by plasma-enhanced chemical vapour deposition
- 15 January 1992
- journal article
- Published by Elsevier in Materials Science and Engineering: B
- Vol. 11 (1-4) , 73-77
- https://doi.org/10.1016/0921-5107(92)90194-e
Abstract
No abstract availableKeywords
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