Optical measurement of silicon membrane and beam thickness using a reflectance spectrometer
- 1 June 1988
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 35 (6) , 801-803
- https://doi.org/10.1109/16.2535
Abstract
No abstract availableThis publication has 1 reference indexed in Scilit:
- A Water-Amine-Complexing Agent System for Etching SiliconJournal of the Electrochemical Society, 1967