I-Line lithography of poly-(3,4-ethylenedioxythiophene) electrodes and application in all-polymer integrated circuits
- 9 December 2002
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 81 (24) , 4556-4558
- https://doi.org/10.1063/1.1524031
Abstract
Industrialization of polymer electronics requires the use of safe solvents. To that end an I-line lithography process for conducting thin poly(3,4-ethylenedioxythiophene) films has been developed. The fully waterborne process is based on photocrosslinking using bisazide- and polyazide-type photoinitiators. The minimum feature size realized comprises 2.5 μm wide lines separated by 1 μm spacings. The sheet resistance is 1 kΩ/square. The process has been applied to fabricate all-polymer integrated circuits. The technology is demonstrated with functional 15-bit code generators.Keywords
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