Surface analysis for Si-wafers using total reflection X-ray fluorescence analysis
- 1 January 1989
- journal article
- Published by Springer Nature in Analytical and Bioanalytical Chemistry
- Vol. 333 (4-5) , 524-526
- https://doi.org/10.1007/bf00572369
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Application of Total Reflection X-Ray Fluorescence Analysis for Metallic Trace Impurities on Silicon Wafer SurfacesPublished by ASTM International ,1989
- An X-ray fluorescence spectrometer with totally reflecting sample support for trace analysis at the ppb levelAnalytical and Bioanalytical Chemistry, 1978
- Nomenclature, symbols, units and their usage in spectrochemical analysis—II. data interpretation Analytical chemistry divisionSpectrochimica Acta Part B: Atomic Spectroscopy, 1978